Characterization

Thin Films

The profilometer uses a 2 micron stylus to measure step heights and average surface/RMS roughness.  It’s 3-D capabilities can be used to map features.

The white light interferometer is a fast, nondestructive method for characterizing and quantifying surface roughness, step heights, critical dimensions, and other topographical features with dimensions ranging from < 1 nm up to 10000 µm. (See photo right)

The spectroscopic ellipsometer is used to characterize surfaces and thin films.  Ellipsometry is a non contact, non destructive optical method that functions by measuring the change in polarization state of light reflected from a sample. Modeling the change in polarization yields film thickness, surface roughness and optical properties.

  • Ocean Optics USB 4000 Fiberoptic UV-Vis Spectrophotometer

The USB 4000 is used to measure absorbance and transmission characteristics of liquid and thin film samples from 200 – 850 nm. A variable angle reflection sample system is included in the setup.

  • Horiba Fluorolog 3 Spectrofluorometer with quantum yield accessory

The spectrofluorometer is used to measure both the excitation and emission spectra of photo- luminescent materials. This information is used to investigate the quantum mechanical states of the materials. The quantum yield accessory allows for absolute measurements.

Devices

Glovebox integrated Oriel Sol2A solar simulator and Keithley IV station.

The QEX10 is used for external quantum efficiency (EQE) measurements. EQE is also known as the Incident Photon Conversion Efficiency (IPCE) of a solar cell. The EQE measures the current obtained per incoming photon as a function of wavelength. This system is available for measurements inside and outside of the glovebox, and has various accessories, including an integrating sphere for reflectance measurements, and lamps for QE measurements under light bias.

The MM 450M-B is integrated into the glovebox, and available as a general purpose probe station.

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